About this role
EUV Mask BEOL R&D Engineer at Micron Technology. Location: Boise, Idaho, United States. Role: developing technologies, leading programs, modeling lithography Requirements: MS or PhD in a technical field and 2+ years in semiconductor manufacturing or equivalent research; experience with mask/lithography, actinic inspection, defect assessment, modeling, and supplier engagement preferred. Category: Research and Development (R&D) Seniority: Entry Level Tools: OPC Commitment: Full Time Workplace: Onsite Languages: English