About this role
Dear User, please be advised that the EURAXESS and HR Excellence in Research portals will be unavailable for scheduled maintenance on 13 Jul 2026, from 13:00 to 15:30 CET . We apologize for any inconvenience this may cause and appreciate your understanding. Page contents 19 Jan 2026 ARCNL Research Field Physics » Applied physics Physics » Optics Researcher Profile First Stage Researcher (R1) Application Deadline 18 Jul 2026 - 10:54 (UTC) Country Netherlands Type of Contract Temporary Job Status Not Applicable Hours Per Week 40.0 Is the job funded through the EU Research Framework Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No Offer Description Work Activities This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL's Source Department. The research activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group's research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11 , (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133 , (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20 , (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123 , (2023)]. Background The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science - a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficien...