In cooperation with the Chair of Laser Technology (LLT), the Fraunhofer Institute for Laser Technology (ILT)—Europe’s leading center for contract research and development in the field of laser technology—is offering the opportunity to write a thesis on the topic: »Pump-Probe of fs DUV-Induced Transient Electron Dynamics in Low-κ Dielectrics for AI-Chips«. Nanoporous low-κ dielectrics (e.g. SiCO:H) are key materials in advanced microelectronic packaging, yet their ultrafast optical response to deep-UV femtosecond excitation remains entirely unexplored. Understanding the transient free-carrier dynamics in these materials is essential to assess whether their optical properties can be deliberately switched from transparent to absorbing on ultrafast timescales. Such transient »metallisation« could unlock novel laser processing routes for substrate-preserving grooving and structuring of low-κ layer systems. This thesis investigates the fundamental laser-material interaction by pump-probe spectroscopy: a 257 nm femtosecond pulse excites the low-κ material, while a time-delayed probe pulse measures the transient changes in reflectivity and transmissivity. The goal is to quantify the generated free-electron density, its spatial confinement, relaxation behaviour, and the resulting modification of optical constants—providing the basis for next-generation advanced manufacturing steps for GPUs or CPUs. Be part of change <ul> <li>You will set up and align the pump-probe experiment (257 nm fs-pump, variable probe)</li> <li>You will systematically measure transient reflectivity/transmissivity as a function of DUV fluence and time delay</li> <li>Finally, you will determine free-electron densities, relaxation times, and transient optical constants</li> </ul> What you contribute <ul> <li>You are studying Mechanical Engineering, Mechatronics, or a comparable programme</li> <li>You are interested in application-oriented research at the intersection of photonics and semiconductor manufacturing</li> <li>You work organised, structured, and independently</li> </ul> What we offer 👥 Team spirit: Creative, interdisciplinary environment with a motivated team, flat hierarchies, and an informal culture. 🖥 Workplace: Excellent range of machines and equipment, as well as first-class office facilities. 💪 Involvement: Practice-oriented thesis in an innovative applied research environment. 🧘 Work-life balance: Benefit from flexible working hours based on trust. 🚐 Getting there: Good transport connections, parking spaces directly in front of the institute, an e-charging station, and a parking garage. The position is limited in duration until completion of the thesis. We value and promote the diversity of our employees' skills and therefore welcome all applications – regardless of age, gender, nationality, ethnic and social origin, religion, ideology, disability, sexual orientation and identity. Severely disabled persons are given preference in the event of equal suitability. Our tasks are diverse and adaptable – for applicants with disabilities, we work together to find solutions that best promote their abilities. With its focus on developing key technologies that are vital for the future and enabling the commercial utilization of this work by business and industry, Fraunhofer plays a central role in the innovation process. As a pioneer and catalyst for groundbreaking developments and scientific excellence, Fraunhofer helps shape society now and in the future. Ready for a change? Then apply now and make a difference! Once we have received your online application, you will receive an automatic confirmation of receipt. We will then get back to you as soon as possible and let you know what happens next. If you have any questions about this position, please contact: Sönke Vogel, M.Sc. Phone: +49 241 8906-180 Fraunhofer Institute for Laser Technology ILT <a href="http://www.ilt.fraunhofer.de" target="_blank" rel="noopener">www.ilt.fraunhofer.de</a> Requisition Number: 84908 Application Deadline: 08/31/2026

Thesis: Pump-Probe of fs DUV-Induced Transient Electron Dynamics in Low-κ Dielectrics for AI-Chips (Aachen, DE, 52074) @ Fraunhofer-Gesellschaft

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